Evaporation (PVD)

Evaporation by Joule effect (resistive), electron gun and/or induction.

• Particularly suitable for lift-off
• Custom loudspeakers
• Plasma treatment, ion beam (pickling or assistance), oxidation or recrystallization possible
• Auto or manual loading, single or from 5 or 25-wafer cassettes
• Customized chuck (flange or electrostatic hold)
• Static, dynamic, planetary, double planetary (satellite) and oscillating deposits
• Airlock possible
• Substrate temperature range: -60° to +1000°C
• Automatic pumping
• Multi-layered possibilities with multi-cuspets
• Possible doping
• Thickness measurement system (laser interferometer or quartz balance)
• Wafer up to 300 mm (more on request)