KLOE's UV-KUB2 and UV-KUB3 models offer advanced solutions for various applications.
The UV-KUB2 and UV-KUB3 equipment benefit from KLOE's expertise in optical design, thus offering unmatched performance in the field of photolithography.
- Homogeneous exposure: The UV-KUB2 and UV-KUB3 systems provide homogeneous UV exposure with a variation of +/- 5%, ensuring uniform results.
- Long LED life : The UV-LED sources of the UV-KUB2 and UV-KUB3 have a lifespan of over 10,000 hours, thus reducing maintenance costs.
- Precision and flexibility : The UV-KUB2 and UV-KUB3 systems offer a resolution of up to 1µm, allowing complex patterns to be produced with high precision.
- Intuitive user interface : The UV-KUB3 model is equipped with a 15.6" touch screen and an ergonomic joypad for easy and quick to use.
- Safety and cleanliness: The exposure chambers of the UV-KUB2 and UV-KUB3 are completely enclosed, ensuring amaximum securityfor the user and optimum cleanliness.
Applications :
- Microfluidics : Fabrication of microfluidic devices with high precision.
- Microelectronics : Production of integrated circuits and electronic components.
- Photonics : Fabrication of optical devices such as microlenses and diffraction gratings.
- Surface functionalization : Modifying surfaces for specific properties.
The UV-KUB2 and UV-KUB3 equipment are designed to provide consistent and precise UV exposure, ensuring exceptional flexibility and precision to meet the needs of high-tech industries.
With the UV-KUB range, you benefit from cutting-edge equipment, offering high performance, an extraordinary user experience for equipment designed and manufactured in France.
UV-KUB2 :
- Resolution: 1µm.
- Divergence angle: < 2°.
- Number of programmable cycles: 10.
- Exposure cycles (continuous/discontinuous): From 1s to 1h.
- Process: Physical contact (hard) or proximity (soft).
- Wavelength: 365nm +/- 5nm.
- Homogeneous exposure: +/- 5%.
- LED life: > 10,000 hours.
- Work surface: 4" or 6" pads.
- Substrate heating during exposure: < 1°C.
- Compatible photoresists: SU8, Shipley, AZ Resist, K-CL resist (developed by Kloe).
UV-KUB3 :
- Resolution: 1µm.
- Divergence angle: < 2°.
- Number of programmable cycles: 100.
- Exposure cycles (continuous or cyclic): From 1s to 1h.
- Process: Physical contact (hard) or proximity (soft).
- Visualization system: 1.5µm resolution.
- XYZ substrate displacement: 0.4µm resolution.
- UV-LED source: Wavelength of 365nm +/- 5nm.
- Homogeneous exposure: +/- 5%.
- LED life: > 10,000 hours.
- Work surface: 4" or 6" pads.
- Accepted mask sizes: Up to Ø 5" or Ø 7".
- Accepted substrate sizes: Ø 2", Ø 4", Ø 6" and 50 x 50mm, 100 x 100mm.
- Substrate heating during exposure: < 1°C.
- Compatible photoresists: SU8, Shipley, AZ Resist, K-CL resist (developed by Kloe)
Options available for the Dilase range :
- Filters to reduce power density: Available for Dilase 125 models.
- Video Realignment System: Option for increased accuracy.
- LED Sources: 325nm, 375nm and 405nm wavelength options.
- Samples Accepted: Various sizes and thicknesses of compatible substrates.
KLOE's UV-KUB series equipment offers customizable solutions to meet specific customer needs in microelectronics, microfluidics, micromechanics, photolithography and more.
