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Spin Coater Classic OPTIspin

Spin Coater mono wafer

Browse the products in the range

Robotechnik's OPTIspin series is a range of high-performance spin coaters designed for various coating applications in the microelectronics and semiconductor industries. These systems are ideal for coating wafers and other substrates, ensuring excellent uniformity and repeatability. The OPTIspin series includes various models, each tailored to specific needs and applications.

The OPTIspin SB20 is ideal for typical coating applications of wafers up to 8 inches or substrates up to 6x6 inches. It can also handle development, cleaning, and drying applications. The ST20 and ST22 models offer similar capabilities with additional features such as a self-contained stainless steel cabinet for easy operation and maintenance. The ST30 and ST32 models support larger wafers up to 12 inches and substrates up to 9x9 inches, making them suitable for larger applications.

Technical Advantages :

  • Uniformity and Repeatability: The three-part process bowl design ensures excellent coating uniformity and repeatability on different wafer sizes.
  • Versatility: Able to handle various processes including coating, developing, cleaning and drying.
  • Ease of Use: Features such as programmable speed and acceleration, touch screen and easily removable process bowls improve user experience and maintenance.
  • Automation: Options for electronic media arms, programmable dispensing systems, and other automated features improve process efficiency and repeatability.

Applications :

These spin coaters are widely used in the semiconductor industry for processes such as photoresist coating, development, and cleaning. They are essential tools for achieving high-quality, uniform coatings on various substrates, ensuring optimal performance in subsequent manufacturing steps.

User interface with touch screen.
Programmable speed and acceleration.
Easy replacement of chucks for different substrate sizes.
Easily replaceable process bowls.
Up to 1000 programmed recipes.
Interface Ethernet.

OPTIspin SB20 :

  • Wafer size: up to Ø 8” (200 mm) or substrate size up to 6” x 6” (150 x 150 mm)
  • Rotation speed: up to 10,000 rpm
  • Dimensions : 465 mm x 516 mm x 450 mm

OPTIspin ST20 :

  • Wafer size: up to Ø 8” (200 mm) or substrate size up to 6” x 6” (150 x 150 mm)
  • Rotation speed: up to 6,000 rpm
  • Dimensions : 1200 mm x 650 mm x 1320 mm

OPTIspin ST22 :

  • Wafer size: up to Ø 8” (200 mm) or substrate size up to 6” x 6” (150 x 150 mm)
  • Rotation speed: up to 6,000 rpm
  • Dimensions : 1200 mm x 650 mm x 1320 mm

OPTIspin ST30 :

  • Wafer size: up to Ø 12” (300 mm) or substrate size up to 9” x 9” (225 x 225 mm)
  • Rotation speed: up to 6,000 rpm
  • Dimensions : 1200 mm x 779,5 mm x 1320 mm

OPTIspin ST32 :

  • Wafer size: up to Ø 12” (300 mm) or substrate size up to 9” x 9” (225 x 225 mm)
  • Rotation speed: up to 6,000 rpm
  • Dimensions : 1200 mm x 650 mm x 1530 mm

Robotechnik's Spin Coater range of equipment offers a variety of options to meet specific user needs. :

  • Electronic media arm: Programmable in position and speed.
  • Photosensitive resin dispensing systems: Dispensing by syringe or pumps.
  • Dispensing Nozzles: Spray, full stream (puddle) for various media.
  • Elimination of edge effects: EBR system.
  • Back side rinse.
  • Heated media lines: Up to 80°C.
  • Megasonic nozzle.
  • Chucks: Various sizes, vacuum or low contact.
  • Disposable process bowls: With anti-splash rings.
  • Vacuum pump.
  • Hotplate: Available with standard or HMDS hotplate for ST22 and ST32 models

Connect with our expert
Laurent BEDDELEM
laurent.beddelem@microtest-semi.com
06.34.10.75.23

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