distributeur français d’équipements et consommables pour l’industrie du Semiconducteur.

Atomic Layer Deposition (ALD)

Encapsulix technology: innovative, fast and efficient

Extremely uniform gas flow distribution at high speeds thanks to a unique, patent-protected injector design.
Fast, precise gas injection
Ultra-high-efficiency draining (reduced draining time)
Extremely robust design (long service life)
No parasitic deposits (no cleaning required)
Cycling time is around 30 times faster than standard equipment (up to 100 times faster).

Compact, reliable, optimized equipment:

Design flexibility for research and production needs
200 mm or larger substrates (wafers, glass, supports with 3D parts, etc.)
Capacitively coupled plasma with uniform electric charge distribution
Stand-alone or clustered (MESC), loadlock cassette

Highly configurable equipment :

6 gas
5 metal precursors
4 oxidants (including ozone)
In situ metrology (QCM, ellipsometry, emission spectrometry, impedance sensor, etc.)

Our products

Front End ALD Anric AT200M 1

AT200M

Front End ALD Anric AT410 1 Microtest

AT410/610/810

Front End ALD Anric AT650P 1

AT650 thermal or plasma