The Encapsulix Infinity C200 is an Atomic Layer Deposition (ALD) device designed for a variety of applications in R&D and manufacturing, according to Industry 4.0 standards.
This equipment provides access to a innovative and patented deposition technique offering unmatched deposition performance in terms of speed and uniformity. Its intuitive operation and automatic loading allow easy handling and ramp-up for high-yield production.
Made in France, It benefits from quality after-sales service and technical support.
The Infinity C200 has many advantages:
- Patented Gas Injection Technology: This technology enables uniform laminar injection at high speed, reducing parasitic deposits and improving process efficiency.
- Exceptional deposition performance: Thanks to its advanced technology, the Infinity C200 offers unmatched deposition speeds (up to 100A/min) and exceptional layer uniformity (≤1% over 200 and 300 mm).
- Application Versatility: The Infinity C200 is capable of both high and low temperature deposition, making it suitable for a wide range of applications including OLEDs, micro displays, and specialty semiconductors.
- Ergonomics and compactness: Its compact design allows easy integration into various production and R&D environments.
- Technical support and after-sales service: Made in France, the Infinity C200 benefits from responsive after-sales service and efficient technical support.
The Infinity C200 is suitable for many applications :
- OLED and Micro-Displays : It enables thin film encapsulations (TFE) to protect flexible OLED devices against corrosion and humidity, ensuring extended lifetime and optimal performance.
- Power Electronics : In power electronics, Infinity C200 is used to deposit protective layers on compound semiconductors. These layers improve the reliability and performance of electronic devices by reducing losses and increasing resistance to harsh environmental conditions.
- Batteries : Excellent deposit conformity is optimal for this application. The Infinity C200 allows thin layers to be deposited on the electrodes, improving their chemical stability and performance. These deposits help increase the storage capacity and life of the batteries.
- Specialty Semiconductors : The Infinity C200 enables high-quality coatings to be deposited on a variety of substrates. These deposits are essential for devices requiring specific electrical and optical properties.
- Advanced Optics : The Infinity C200 allows thin films to be deposited on optical components, improving their transmission and reflection properties. These deposits are crucial for applications requiring high optical precision.
- Photovoltaic : The Infinity C200 is used to deposit thin films on solar cells, improving their efficiency and durability. These deposits help protect the cells from environmental damage and optimize their energy performance.
- MEMS : The Infinity C200 enables high-precision deposition on complex structures. These depositions are essential to ensure the reliability and performance of MEMS devices.
- Patented Gas Injection System: Uniform high-speed laminar injection, ultra-efficient purge, reduced parasitic deposit.
- Deposition speed: up to 100 A/min
- Approximately 30 times faster than standard industrial systems.
- Uniformity of deposits: ≤ 1% over 200 and 300 mm.
- Substrate size: 200 mm (extension to 300 mm available)
- Configurable for up to 6 gases, 5 metal precursors and 3 oxidants.
- Gas supply system: Laminar flow pulse sequence, software optimized management, high quality components (AERA mass flow meters, APTECH and FUJIKIN valves, INFICON gauges).
- Capacitive plasma (option): Radicals created as close as possible to the substrate, controlled plasma etching, uniform distribution of electrical charges.
- Reaction chamber: Stainless steel, aluminum, compatible with organometallic chemicals.
- Automatic loading dock (option): Compatible with high vacuum environments, precise and controlled loading and unloading, Z-lift mechanism for precise vertical movement.
- Ozone generation system: Gas pipeline, ozone generator, ozone concentration sensor.
- Additional Heated Precursor System: Temperature control rack, safety shutoff valves, heated capacitive gauge.
- Quartz crystal monitor: In situ metrology by QCM quartz balance for deposit thickness measurement.
- Optical Emission Spectrometer: Plasma monitoring, combination of software and hardware.
- Single wafer loading airlock: allows for optimization of deposition processes (performance and repeatability).
- Cassette loading lock: Multi-substrate loading per cassette, programming of different recipes, reduction of handling.
- Drybed Absorber CS Clean: Waste gas treatment system, rechargeable absorbent column.
- Preventive maintenance contract: 2 preventive visits per year, cleaning and replacement of canisters.
