Hot plates

Robotechnik's OPTIhot series includes high-performance hotplate systems designed for various lithography baking applications and HMDS processes. These systems are ideal for achieving excellent process results, uniformity, and repeatability. The OPTIhot series includes various models, each tailored to specific needs and applications.

The OPTIhot HB20+ is a compact hotplate module suitable for wafers up to 8” and substrates up to 6”x 6”. It is designed for typical lithography bake applications up to 250°C, with an optional extension to 350°C. The OPTIhot HT24 is a hotplate system consisting of four OPTIhot HB20 modules, providing a unified solution for larger-scale operations. The OPTIhot SHT20 and SHT30 are standalone hotplate systems designed for wafers up to 8” and 12” respectively, with programmable temperature ranges up to 350°C. The OPTIhot SVT20 is specifically designed for HMDS wafer priming and dehydration bake applications, combining steam priming and vacuum dehydration bake processes.

Technical Advantages :

• Uniformity and Repeatability: The optimized design of the heating plates ensures excellent uniformity and repeatability of cooking on different wafer sizes.
• Versatility: Capable of handling various processes including cooking, HMDS processes and dehydration cooking.
• Ease of Use: Features such as programmable temperature control, touchscreen and easy integration into existing systems improve user experience and maintenance.
• Automation: Options for programmable nitrogen purging, vacuum pumps, and other automated features improve process efficiency and repeatability.

Applications :

These heating plates are widely used in the semiconductor industry for processes such as photoresist curing, HMDS processes, and dehydration curing. They are essential tools for achieving high-quality, uniform curing on various substrates, ensuring optimal performance in subsequent manufacturing steps.