distributeur français d’équipements et consommables pour l’industrie du Semiconducteur.

Evaporation (PVD)

Evaporation by Joule effect (resistive), electron gun and/or induction.

  • Particularly suitable for lift-off
  • Custom loudspeakers
  • Plasma treatment, ion beam (pickling or assistance), oxidation or recrystallization possible
  • Auto or manual loading, single or from 5 or 25-wafer cassettes
  • Customized chuck (flange or electrostatic hold)
  • Static, dynamic, planetary, double planetary (satellite) and oscillating deposits
  • Airlock possible
  • Substrate temperature range: -60° to +1000°C
  • Automatic pumping
  • Multi-layered possibilities with multi-cuspets
  • Possible doping
  • Thickness measurement system (laser interferometer or quartz balance)
  • Wafer up to 300 mm (more on request)