Evaporation by Joule effect (resistive), electron gun and/or induction.
- Particularly suitable for lift-off
- Custom loudspeakers
- Plasma treatment, ion beam (pickling or assistance), oxidation or recrystallization possible
- Auto or manual loading, single or from 5 or 25-wafer cassettes
- Customized chuck (flange or electrostatic hold)
- Static, dynamic, planetary, double planetary (satellite) and oscillating deposits
- Airlock possible
- Substrate temperature range: -60° to +1000°C
- Automatic pumping
- Multi-layered possibilities with multi-cuspets
- Possible doping
- Thickness measurement system (laser interferometer or quartz balance)
- Wafer up to 300 mm (more on request)
