distributeur français d’équipements et consommables pour l’industrie du Semiconducteur.

AT200M

tabletop, substrat 2’’, (ANRIC)

Parcourir les produits de la gamme

  • Small footprint (~15 in3 or 38.1 cm3) to easily fit in a glove box or next to an evaporator for SEM/TEM.
  • A precursor and a counter-reagent (also available as an option with 4 ports)
  • Semiconductor grade components
  • Metal Sealed Lines
  • Ventilated precursor enclosure
  • High temperature compatible, fast pulsing ALD valves with ultra-fast MFC for integrated inert gas purge.
  • Precursors (up to 150°C), collector, heated chamber to ensure the absence of condensation.
  • Robust PLC-driven user interface
  • Stainless steel chamber can be heated to 300°C
  • 5″ screen with integrated PLC controller (no PC required)

BEDROOM

  • RT chamber temperatures at 300°C ± 1°C
  • RT precursor temperatures at 150°C ± 2°C (with heating jacket)
  • Smallest footprint on the market (1.6 sq ft), tabletop installation, compatible with rooms
  • white, can also be placed in a glove box.
  • Simple system maintenance and low energy and precursor consumption.
  • Low chamber volume
  • Very fast cycling capacity.
  • Full HW and SW interlocks for safe operation, even in a multi-user environment.

 

SOFTWARE

  • Human-machine interface (HMI) PLC system with 5-inch touch screen.
  • Advanced controls suitable for standard ALD cycle deposition
  • Recipe database for tested, high-quality processes
  • Personalized recipe entry screen
  • Real-time display of process status
  • Individually programmable heating source temperatures
  • Integrated pulse sequences for ternary compounds and nanolaminates
  • Quick operation with simple questions to get the user started
  • Entering subcycles and overall cycles

OPTIONS

  • No integration into a glove box (fits in a glove box). Custom chuck/tray (square, circular, double substrates, baskets, small parts, thicker substrates)
  • ATOzone - Ozone generator (necessary for certain films: Pt, Ir, SiO2, MoO2, high quality Al2O3 below 60°C, high quality HfO2).
  • Option - Ozone Safety Monitor with real-time detection of ambient gaseous ozone
  • 4 port option (e.g.: 2 heated precursors, 1 unheated precursor, 1 counter-reagent)
  • Powder coating drum
  • External control - PC/software link (allows remote programming and operation)
  • Ventilated precursor cabinet included
  • Spare rooms

 

UTILITES

  • N2 purge gas should be >99.9995% with a shut-off valve (regulated to 10 - 30 psi, metal sealed),
  • Connect the nitrogen purge gas (UHP) via a 1/4″ sealed metal line to the 1/4″ compression fitting at the rear of the chamber.
  • Attach 90-110 psi clean dry air via 1/4″ polyethylene pipe or metal conduit to the other 1/4″ compression fitting.
  • Secure the pump with a suitable 1″ vacuum hose (preferably metal (SS)) (KF25), O-ring and hose clamp.
  • The other side (exhaust side) of the vacuum pump (*perfluorinated vacuum oil like Fomblin, required) should go to the standard lab exhaust or roof with a draft >5cfm (1″ pipe, also).
  • Beyond one meter, 1.5″ tubes (NW40) must be used.
  • The precursors are fixed using female VCR elbows (always use new joints). 1/4″ joint first (with gloves)

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