PECVD (CCP-CVD, ICP-CVD and MWCVD), HWCVD, ECRCVD, HTCVD, MOCVD and ALD/PEALD
- Single or multi-chamber (cluster)
- Up to 12 gas lines
- Solid, liquid or gaseous precursors
- Custom loudspeakers
- Auto or manual loading, single or from 5 or 25-wafer cassettes
- Custom-made Chuck
- Airlock possible
- Substrate temperature possible from +20° to +1000°C
- Automatic pumping
- Multi-layer possibilities
- Possible doping
- Thickness measurement system (laser interferometer or quartz balance)
- Wafer up to 300 mm (more on request)