distributeur français d’équipements et consommables pour l’industrie du Semiconducteur.

Mask Aligner

UV LED Masking System with UV-KUB 3 Mask Aligner

KLOE has significant experience in photolithography thanks to its DILASE direct laser writing technology, and has introduced the UV-KUB range of equipment for UV exposure of photosensitive materials. The UV-KUB is a simple exposure system based on UV LEDs with 2 sources available at 365 or 405 nm, depending on the version. It is a very compact table top system allowing the exposure of wafers up to 4 inches.

The UV-KUB 3 has a perfectly monochromatic source at 365 or 405 nm, is compatible with all photosensitive resins and offers a resolution of 2 µm. It is, moreover, compatible with “hard and soft contact” processes, and allows control of the distance between the mask and the substrate. Mask alignment is performed with an accuracy of less than 3 µm.