Atmospheric plasma cleaning

Atmospheric Plasma ONTOS TT

The ONTOS TT system is a revolutionary piece of equipment for substrate cleaning using helium plasma combined with various gases to deliver outstanding results:

• Removes native oxide from metal and semiconductor surfaces.
• Removes residual organic contamination films
• Fast, non-toxic, dry and atmospheric process.
• Low-energy surface chemistry – safe for CMOS
• Ideal surface preparation for direct bonding
• Compact tabletop configuration
• Can be integrated into automatic systems