AT200M
tabletop, 2'' substrate, (ANRIC)
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Presentation
- Small footprint (~15 in3 or 38.1 cm3) to easily fit in a glove box or next to an evaporator for SEM/TEM.
- A precursor and a co-reactant (also available as an option with 4 ports)
- Semiconductor grade components
- Metal Sealed Lines
- Ventilated precursor enclosure
- High temperature compatible, fast pulsing ALD valves with ultra-fast MFC for integrated inert gas purge.
- Precursors (up to 150°C), collector, heated chamber to ensure the absence of condensation.
- Robust PLC-driven user interface
- Stainless steel chamber can be heated to 300°C
- 5″ screen with integrated PLC controller (no PC required)
Technical Specs
CHAMBER
- Chamber temperatures from RT to 300°C ± 1°C
- Precursor temperatures from RT to 150°C ± 2°C (with heating jacket)
- Smallest footprint on the market (1.6 sq ft), tabletop installation, cleanroom compatible,
- can also be placed in a glove box.
- Simple system maintenance and low power and precursor consumption.
- Low chamber volume
- Very fast cycling capability.
- Full HW and SW interlocks for safe operation, even in a multi-user environment.
SOFTWARE
- PLC system with human-machine interface (HMI) and 5-inch touchscreen.
- Advanced controls tailored to standard ALD cycle deposition
- Recipe database for tested, high-quality processes
- Custom recipe entry screen
- Real-time display of process status
- Individually programmable heated source temperatures
- Integrated pulse sequences for ternary compounds and nano-laminates
- Quick operation with simple prompts to allow the user to get started
- Entry of sub-cycles and overall cycles
Options and Utilities
OPTIONS
- No integration into a glove box (fits in a glove box). Custom chuck/tray (square, circular, double substrates, baskets, small parts, thicker substrates)
- ATOzone - Ozone generator (necessary for certain films: Pt, Ir, SiO2, MoO2, high quality Al2O3 below 60°C, high quality HfO2).
- Option - Ozone Safety Monitor with real-time detection of ambient gaseous ozone
- 4 port option (e.g.: 2 heated precursors, 1 unheated precursor, 1 co-reactant)
- Powder coating drum
- External control - PC/software link (allows remote programming and operation)
- Ventilated precursor cabinet included
- Spare chambers
UTILITIES
- N2 purge gas should be >99.9995% with a shut-off valve (regulated to 10 - 30 psi, metal sealed),
- Connect the nitrogen purge gas (UHP) via a 1/4″ sealed metal line to the 1/4″ compression fitting at the rear of the chamber.
- Attach 90-110 psi clean dry air via 1/4″ polyethylene pipe or metal conduit to the other 1/4″ compression fitting.
- Secure the pump with a suitable 1″ vacuum hose (preferably metal (SS)) (KF25), O-ring and hose clamp.
- The other side (exhaust side) of the vacuum pump (*perfluorinated vacuum oil like Fomblin, required) should go to the standard lab exhaust or roof with a draft > 5cfm (1″ pipe, also).
- Beyond one meter, 1.5″ tubes (NW40) must be used.
- The precursors are fixed using female VCR elbows (always use new joints). 1/4″ joint first (with gloves)
