Infinity M500
Encapsulix Infinity M500 ALD
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Presentation
The Encapsulix Infinity M500 is an Atomic Layer Deposition (ALD) equipment designed for large-scale applications in nanotechnology. It is ideal for rapid, low-temperature deposition on large substrates 400 mm x 500 mm. This equipment offers a turnkey solution for industrial R&D, pilot production and high-volume manufacturing environments.
The Infinity M500 has many advantages:
- Patented Gas Injection Technology: This technology enables uniform laminar injection at high speed, reducing parasitic deposits and improving process efficiency1.
- Exceptional deposition performance: Thanks to its advanced technology, the Infinity M500 offers unmatched deposition speeds (up to 100A/min) and exceptional layer uniformity.
- Application Versatility: Capable of high and low temperature deposition, the Infinity M500 is suitable for a wide range of applications including OLED, microdisplays, semiconductor, and photovoltaics.
- Ergonomics and compactness: Its compact design allows easy integration into various production and R&D environments.
- Technical support and after-sales service: Made in France, the Infinity C200 benefits from responsive after-sales service and efficient technical support.
- Standalone operation or integrated vacuum cluster: The Infinity M500 can operate as a standalone unit or be integrated into a vacuum cluster, offering maximum flexibility for production environments.
- Fully automated operation: The Infinity M500 is designed for fully automated operation.
- Design optimized for cleanliness and ease of maintenance: The Infinity M500 is designed to minimize maintenance requirements and maximize cleanliness, ensuring continuous and efficient production.
The Infinity M500 is suitable for many applications:
- OLED and Organic Electronics: The Infinity M500 is ideal for deposition on Gen 2.5 glass substrates used in OLEDs and organic electronics. It enables thin-film encapsulation (TFE) to protect OLED devices against corrosion and moisture, ensuring extended lifespan and optimal performance.
- Photovoltaics: Including perovskite PV, the Infinity M500 allows for the deposition of thin films on solar cells, improving their efficiency and durability. These deposits protect cells against environmental damage and optimize their energy performance.
- Batteries and Supercapacitors: The Infinity M500 enables the deposition of thin layers on electrodes, improving their chemical stability and performance. These deposits contribute to increasing storage capacity and battery life.
- MEMS and Semiconductors: The Infinity M500 is also used for MEMS (Micro-Electro-Mechanical Systems) and semiconductors, where it enables high-precision deposition on complex structures. These deposits are essential to guarantee the reliability and performance of MEMS devices1.
- Optics: The Infinity M500 is used to deposit thin films on optical components, improving their transmission and reflection properties. These deposits are crucial for applications requiring high optical precision.
Specifications
- Patented gas injection system: High-speed uniform laminar injection, ultra-efficient purging, reduction of parasitic deposition.
- Deposition speed: up to 100 A/min
- Approximately 30 times faster than standard industrial systems.
- Deposition uniformity: ≤ 1% over 300 mm.
- Substrate size: up to 400 x 500 mm.
- Configurable for up to 5 metal precursors and 5 oxidants.
- Gas delivery system: Laminar flow pulse sequence, software-optimized management, high-quality components (AERA mass flow controllers, APTECH and FUJIKIN valves, INFICON gauges).
- Available options: Ozone, PEALD, and plasma pre-cleaning.
- Reaction chamber: Stainless steel, aluminum, compatible with organometallic chemicals.
- Design optimized for cleanliness and ease of maintenance.
- ALD growth cycle: Cycle time less than 1000 ms at 90°C for Al2O3 with TMA + H2O.
- CE Compliance: According to EN 13849-1, EN 60204-1, EN 12000.
Options
- Ozone generation system: Gas pipeline, ozone generator, ozone concentration sensor.
- Capacitive plasma for PEALD.
- Optical Emission Spectrometer: Plasma monitoring, combination of software and hardware.
- Additional Heated Precursor System: Temperature control rack, safety shutoff valves, heated capacitive gauge.
- Quartz crystal monitor: In situ metrology by QCM quartz balance for deposit thickness measurement.
- Single wafer loading SAS: allows for optimization of deposition processes (performance and repeatability).
- Cassette loading lock: Multi-substrate loading by cassette, programming of different recipes, reduction of handling.
- Drybed Absorber CS Clean: Waste gas treatment system, rechargeable absorbent column.
Preventive maintenance contract: 2 preventive visits per year, cleaning and replacement of canisters.
