Infinity C200
ALD Encapsulix Infinity C200
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Presentation
The Encapsulix Infinity C200 is an Atomic Layer Deposition (ALD) device designed for a variety of applications in R&D and manufacturing, according to Industry 4.0 standards.
This equipment provides access to an innovative and patented deposition technique offering unmatched deposition performance in terms of speed and uniformity. Its intuitive operation and automatic loading allow easy handling and ramp-up for high-yield production.
Made in France, it benefits from quality after-sales service and technical support.
The Infinity C200 has many advantages:
- Patented Gas Injection Technology: This technology enables uniform laminar injection at high speed, reducing parasitic deposits and improving process efficiency.
- Exceptional deposition performance: Thanks to its advanced technology, the Infinity C200 offers unmatched deposition speeds (up to 100A/min) and exceptional layer uniformity (≤1% over 200 and 300 mm).
- Application Versatility: The Infinity C200 is capable of both high and low temperature deposition, making it suitable for a wide range of applications including OLEDs, micro displays, and specialty semiconductors.
- Ergonomics and compactness: Its compact design allows easy integration into various production and R&D environments.
- Technical support and after-sales service: Made in France, the Infinity C200 benefits from responsive after-sales service and efficient technical support.
The Infinity C200 is suitable for many applications:
- OLED and Micro-Displays: It enables the encapsulation of thin films (TFE) to protect flexible OLED devices against corrosion and humidity, thus ensuring extended lifespan and optimal performance.
- Power Electronics: In the field of power electronics, the Infinity C200 is used to deposit protective layers on compound semiconductors. These layers improve the reliability and performance of electronic devices by reducing losses and increasing resistance to harsh environmental conditions.
- Batteries: The excellent conformity of deposits is optimal for this application. The Infinity C200 allows for the deposition of thin layers on electrodes, thereby improving their chemical stability and performance. These deposits contribute to increasing the storage capacity and lifespan of batteries.
- Specialty Semiconductors: The Infinity C200 enables the deposition of high-quality layers on various substrates. These deposits are essential for devices requiring specific electrical and optical properties.
- Advanced Optics: The Infinity C200 allows for the deposition of thin layers on optical components, thereby improving their transmission and reflection properties. These deposits are crucial for applications requiring high optical precision.
- Photovoltaics: The Infinity C200 is used to deposit thin layers on solar cells, thereby improving their efficiency and durability. These deposits protect the cells against environmental damage and optimize their energy performance.
- MEMS: The Infinity C200 enables high-precision deposition on complex structures. These deposits are essential to ensure the reliability and performance of MEMS devices.
Features
- Patented gas injection system: Uniform high-speed laminar injection, ultra-efficient purge, reduction of parasitic deposition.
- Deposition rate: up to 100 A/min
- About 30 times faster than standard industrial systems.
- Deposition uniformity: ≤ 1% over 200 and 300 mm.
- Substrate size: 200 mm (extension to 300 mm available)
- Configurable for up to 6 gases, 5 metallic precursors and 3 oxidizers.
- Gas supply system: Laminar flow pulse sequence, optimized software management, high-quality components (AERA mass flow controllers, APTECH and FUJIKIN valves, INFICON gauges).
- Capacitive plasma (option): Radicals created closest to the substrate, controlled plasma etching, uniform distribution of electrical charges.
- Reaction chamber: Stainless steel, aluminum, compatible with organometallic chemicals.
- Automatic loading airlock (option): Compatible with high vacuum environments, precise and controlled loading and unloading, Z-lift mechanism for precise vertical movement.
Options
- Ozone generation system: Gas pipeline, ozone generator, ozone concentration sensor.
- Additional Heated Precursor System: Temperature control rack, safety shutoff valves, heated capacitive gauge.
- Quartz crystal monitor: In situ metrology by QCM quartz balance for deposit thickness measurement.
- Optical Emission Spectrometer: Plasma monitoring, combination of software and hardware.
- Single wafer loading airlock: allows for optimization of deposition processes (performance and repeatability).
- Cassette loading lock: Multi-substrate loading per cassette, programming of different recipes, reduction of handling.
- Drybed Absorber CS Clean: Waste gas treatment system, rechargeable absorbent column.
- Preventive maintenance contract: 2 preventive visits per year, cleaning and replacement of canisters.
